FORMATION OF NANOSIZED FILMS OF SILICIDES ON SURFACE OF DIFFUSION-ALLOYED SILICON WITH CHROMIUM ATOMS

1Makhmudhodzha Sharipovich Isaev, Abdumalik Gaybullaevich Gaibov,Abdigani Abayevich Eshkulov

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Abstract:

<em>Nanofilms of chromium silicides with thickness of 2-3 nm on surface of diffusion-alloyed monocrystalline silicon are obtained. It is shown, formation of intermediate layer with thickness of ~ 30 mcm between film and volume compensated high-ohm region of crystal. The determined activation energy of the silicidal phase formation process is 1.5 </em>

Keywords:

silicide, film, alloying, annealing, quenching, nucleation, cluster.

Paper Details
Month7
Year2021
Volume25
IssueIssue 3
Pages30-39